Plasmonic titanium nitride nanohole arrays for refractometric sensing

dc.authorid0000-0002-1677-644X
dc.contributor.authorGünaydın, Beyza Nur
dc.contributor.authorGülmez, Mert
dc.contributor.authorTorabfam, Milad
dc.contributor.authorPehlivan, Zeki Semih
dc.contributor.authorTütüncüoğlu, Atacan
dc.contributor.authorKayalan, Cemre Irmak
dc.contributor.authorSaatçioğlu, Erhan
dc.contributor.authorBayazıt, Mustafa Kemal
dc.contributor.authorYüce, Meral
dc.contributor.authorKurt, Hasan
dc.date.accessioned2023-12-15T08:11:33Z
dc.date.available2023-12-15T08:11:33Z
dc.date.issued2023
dc.departmentİstanbul Medipol Üniversitesi, Rektörlük, Sağlık Bilim ve Teknolojileri Araştırma Enstitüsü
dc.departmentİstanbul Medipol Üniversitesi, Mühendislik ve Doğa Bilimleri Fakültesi, Endüstri Mühendisliği Bölümü
dc.description.abstractGroup IVB metal nitrides have attracted great interest as alternative plasmonic materials. Among them, titanium nitride (TiN) stands out due to the ease of deposition and relative abundance of Ti compared to those of Zr and Hf metals. Even though they do not have Au or Ag-like plasmonic characteristics, they offer many advantages, from high mechanical stability to refractory behavior and complementary metal oxide semiconductor-compatible fabrication to tunable electrical/optical properties. In this study, we utilized reactive RF magnetron sputtering to deposit plasmonic TiN thin films. The flow rate and ratio of Ar/N2 and oxygen scavenging methods were optimized to improve the plasmonic performance of TiN thin films. The stoichiometry and structure of the TiN thin films were thoroughly investigated to assess the viability of the optimized operation procedures. To assess the plasmonic performance of TiN thin films, periodic nanohole arrays were perforated on TiN thin films by using electron beam lithography and reactive ion etching methods. The resulting TiN periodic nanohole array with varying periods was investigated by using a custom microspectroscopy setup for both reflection and transmission characteristics in various media to underline the efficacy of TiN for refractometric sensing.
dc.description.sponsorship101111321 ; EP/Y030273/1en_US
dc.identifier.citationGünaydın, B. N., Gülmez, M., Torabfam, M., Pehlivan, Z. S., Tütüncüoğlu, A., Kayalan, C. I. ... Kurt, H. (2023). Plasmonic titanium nitride nanohole arrays for refractometric sensing. ACS Applied Nano Materials, 6(22), 20612-20622. https://dx.doi.org/10.1021/acsanm.3c03050
dc.identifier.doi10.1021/acsanm.3c03050
dc.identifier.endpage20622
dc.identifier.issn2574-0970
dc.identifier.issue22
dc.identifier.pmid38037604
dc.identifier.scopus2-s2.0-85179160088
dc.identifier.scopusqualityQ1
dc.identifier.startpage20612
dc.identifier.urihttps://dx.doi.org/10.1021/acsanm.3c03050
dc.identifier.urihttps://hdl.handle.net/20.500.12511/12011
dc.identifier.volume6
dc.identifier.wos001109824500001en_US
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.indekslendigikaynakPubMed
dc.institutionauthorKurt, Hasan
dc.language.isoen
dc.publisherAmerican Chemical Society
dc.relation.ispartofACS Applied Nano Materialsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.relation.tubitakinfo:eu-repo/grantAgreement/TUBITAK/SOBAG/120F165
dc.rightsAttribution 4.0 International*
dc.rightsinfo:eu-repo/semantics/openAccess
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/*
dc.subjectTransition Metal Nitrides
dc.subjectTitanium Nitride
dc.subjectPlasmonics
dc.subjectNanohole Array
dc.subjectRefractometric Sensing
dc.titlePlasmonic titanium nitride nanohole arrays for refractometric sensing
dc.typeArticle

Dosyalar

Orijinal paket
Listeleniyor 1 - 1 / 1
Yükleniyor...
Küçük Resim
İsim:
Kurt-Hasan-2023.pdf
Boyut:
8.69 MB
Biçim:
Adobe Portable Document Format
Açıklama:
Tam Metin / Full Text
Lisans paketi
Listeleniyor 1 - 1 / 1
Küçük Resim Yok
İsim:
license.txt
Boyut:
1.44 KB
Biçim:
Item-specific license agreed upon to submission
Açıklama: